Plz me get these i need the answer asap

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Consider the reaction: n2(g) + o2(g) ? 2no(g) kc = 0.10 at 2000oc starting with initial concentrations of 0.040 mol/l of n2 and 0.040 mol/l of o2, calculate the equilibrium concentration of no in mol/l how would this be done?

How heavy is thanos? a) 3000 lbs b) all of it c) the price of tea in china d) heavy enough