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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900หc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 21.06.2019 20:10
Why is the vapor pressure of a warm lake higher than the vapor pressure of a cold lake? o a. warm water has a greater heat of vaporization. ob. warm water evaporates more quickly. cool water evaporates more quickly. od. cool water has a greater heat of vaporization.
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What does the oxidation number tell you about an atom...
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