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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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When the speed of the bottle is 2 m/s, the average maximum height of the beanbag is m.
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A solution of CaCl2 in water forms a mixture that is 32.0% calcium chloride by mass. If the total ma...
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