Sif4+sio2 what produced and what

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

What element breaks down into yttrium-90?

Which statement is usually true about the relationship between activation energy and reaction rates? low activation energy barriers result in low rates. high activation energy barriers result in low rates. low activation energy barriers result in no reaction. high activation energy barriers result in no reaction.