Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900Λc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
How many lone pairs of electrons are on the central atom of no3- and what is the molecular shape? one, trigonal planar zero, trigonal pyramidal zero, trigonal planar one, tetrahedral one, trigonal pyramidal
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