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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Answer from each drop-down menu. e characteristics of a borane molecule (bh). the lewis structure and table of electronegativities are given olecular shape is and the molecule is reset next erved. search e a

What is the polyatamic ion of thiosulfate