(b) Which solution has a higher percent ionization of the acid, a 0.10M solution of HC2H3O2(aq) or a 0.010M solution of HC2H3O2(aq) ? Justify your answer including the calculation of percent ionization for each solution.

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

What is the mass of 0.46 mil of mgcl2

Which sample at stp has the same number of atoms as 18 liters of ne at stp