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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 02:20
6. what does the symbol ah stand for? o one calorie given off by a reaction the specific heat of a substance the heat capacity of a substance the heat of reaction for a chemical reaction
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Chemistry, 22.06.2019 03:00
Flourine is found to undergo 10% radioactivity decay in 366 minutes determine its halflife
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2 moles KCl + 3 moles O2 → 2moles KCIO3
Calculate the number of particles of each substance based o...
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