subject
Engineering, 07.12.2019 01:31 kim643

For an n-channel mosfet with gate oxide (sio2) thickness of 30 nm, threshold voltage of 0.7 v, z = 30 um, and length of the device is 0.9 μm, calculate the drain current for vg-3 v and vd-0.2 v. assume that the electron channel mobility is 200 cm'/v-sec. what will be the required drain current to drive the mos in saturation region? how the drain current will change if hfo2 with ks 25 will be used as a gate oxide, whereas other mosfet parameters will be kept the same. what did you mention?

ansver
Answers: 3

Another question on Engineering

question
Engineering, 04.07.2019 18:10
Thermal stresses are developed in a metal when its a) initial temperature is changed b) final temperature is changed c) density is changed d) thermal deformation is prevented e) expansion is prevented f) contraction is prevented
Answers: 2
question
Engineering, 04.07.2019 19:10
Asteam is contained in a rigid tank with a volume of 1 m3. initially, the pressure and temperature are 7 bar and 500 oc, respectively. the temperature drops due to cooling process. determine: (1) the temperature at which condensation begins in °c, (2) the fraction of the total mass that has condensed when the pressure decreased to 0.5 bar. (3) the volume in m3 occupied by saturated liquid at the final state?
Answers: 3
question
Engineering, 04.07.2019 19:10
The air in an automobile tire with a volume of 0.015 m3 is at 32°c and 140 kpa gage. determine the amount of air that must be added to raise the pressure to the recommended value of 206 kpa gage. assume the atmospheric pressure to be 128 kpa and the temperature and the volume to remain constant.[r-0.287 kj/kgk]
Answers: 3
question
Engineering, 04.07.2019 19:10
For a process taking place in a closed system containing gas, the volume and pressure relationship is pvi-constant. -1.5 bar, the process starts with initial conditions, pi = =0.03 m3 and ends with final volume, v2-0.05 m3 determine the work done by the gas.
Answers: 2
You know the right answer?
For an n-channel mosfet with gate oxide (sio2) thickness of 30 nm, threshold voltage of 0.7 v, z = 3...
Questions
question
History, 27.06.2019 18:00
Questions on the website: 13722367