A 1.5 micrometer Aluminum film is deposited over a flat field oxide region and patterned with photoresist. The Aluminum is then etched. The selectivity of Al over photoresist is 5. Assuming a 10% over etch, what is the initial photoresist thickness required to ensure that the final photoresist thickness is 100 nm

Water vapor initially at 10 bar and 400 °c is contained within a piston-cylinder assembly. the water lost heat to the surrounding according to isochoric (iso-volumetric) process until its temperature is 150 °c. the water is then condensed isothermally to saturated liquid. for the water as a system, calculate the work in kj/kg