Mathematics, 04.03.2020 17:35 maay101
3.36 An article in the Journal of the Electrochemical Society (Vol. 139, No. 2, 1992, pp. 524–532) describes an experiment to investigate the low-pressure vapor deposition of polysilicon. The experiment was carried out in a large-capacity reactor at Sematech in Austin, Texas. The reactor has several wafer positions, and four of these positions are selected at random. The response variable is film thickness uniformity. Three replicates of the experiment were run, and the data are as follows: Wafer Position Uniformity 1 2.76 5.67 4.49 2 1.43 1.70 2.19 3 2.34 1.97 1.47 4 0.94 1.36 1.65 (a) Is there a difference in the wafer positions? Use = 0.05. (b) Estimate the variability due to wafer positions. (c) Estimate the random error component. (d) Analyze the residuals from this experiment and comment on model adequacy.
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Mathematics, 21.06.2019 22:30
Ibeg you to me 20. a reaction produces 4.93 l of oxygen, but was supposed to produce 1 mol of oxygen. what is the percent yield?
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Mathematics, 22.06.2019 00:30
Will mark ! (10 points also! ) if x varies inversely with y and x =6 when y= 10, find y when x=8 a. y=4.8 b. y=7.5 c. y=40/3 d. y=4/15
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Mathematics, 22.06.2019 01:20
Can you me with this question? i'll reward *30 points i just need with this one question so that i could solve the others. * edit: i originally set up the question to reward 30 points, but for some reason i can only reward 15. if you don't get 30, then i'm sorry. i'm still kind of new to this site
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3.36 An article in the Journal of the Electrochemical Society (Vol. 139, No. 2, 1992, pp. 524–532) d...
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