Mathematics, 26.03.2020 04:35 lizredrose5
3.36 An article in the Journal of the Electrochemical Society (Vol. 139, No. 2, 1992, pp. 524–532) describes an experiment to investigate the low-pressure vapor deposition of polysilicon. The experiment was carried out in a large-capacity reactor at Sematech in Austin, Texas. The reactor has several wafer positions, and four of these positions are selected at random. The response variable is film thickness uniformity. Three replicates of the experiment were run, and the data are as follows: Wafer Position Uniformity 1 2.76 5.67 4.49 2 1.43 1.70 2.19 3 2.34 1.97 1.47 4 0.94 1.36 1.65 (a) Is there a difference in the wafer positions? Use = 0.05. (b) Estimate the variability due to wafer positions. (c) Estimate the random error component. (d) Analyze the residuals from this experiment and comment on model adequacy.
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Mathematics, 21.06.2019 13:30
Me. i need an answer asap. , you! select the correct answer from each drop-down menu.simplify the given polynomial and use it to complete the statement.the polynomial simplifies to an expression that is a blank with a blank degree of blank .
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Mathematics, 21.06.2019 18:30
Can someone check if i did this right since i really want to make sure it’s correct. if you do you so much
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Mathematics, 21.06.2019 19:50
If the scale factor between two circles is 2x/5y what is the ratio of their areas?
Answers: 3
3.36 An article in the Journal of the Electrochemical Society (Vol. 139, No. 2, 1992, pp. 524–532) d...
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