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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Areaction in which products can react to re-form reactants is
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If i had 2 m naoh solution, what does the 2 m stand for? 2 molar, but 2 of a solute in 1
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What is its molecular compound name for ci4...
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