Identify the type of bond between atoms of h-o in water molecule (using en differences )

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Using the thermodynamic information in the aleks data tab, calculate the standard reaction free energy of the following chemical reaction: →+p4o10s6h2ol4h3po4s round your answer to zero decimal places.

Given the data below for the reaction, 2 a + 2 b + 4 c => d + e + 3 f, the reaction is fill in the [ ] order in a, fill in the [ ] order in b, fill in the [ ] order in c and fill in the [ ] order overall. (use the words "first, second, third, fourth" to fill each blank)experimentinitial conc of a, mol/l initial conc of b, mol/l initial conc of c, mol/l initial rate, mol/l.s1 0.1 0.1 0.2 2 x 10-32 0.2 0.3 0.2 6 x 10-33 0.3 0.1 0.2 2 x 10-34 0.4 0.3 0.4 1.2 x 10-2