Select the ions below which possess the electron configuration of a noble gas.

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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

In a chemical reaction at equilibrium, the rate of the forward reaction the rate of the reverse reaction. if the rate of the forward reaction more products are formed.